Fabrication and characterization of L10-ordered FeNi thin films

L10-ordered FeNi, showing high uniaxial magnetic anisotropy (Ku), is promising as a 'rare metal-free' high Ku material. We have worked on L10-ordered FeNi thin films prepared by two methods: one is molecular beam epitaxy (MBE) with alternate deposition of Fe and Ni monatomic layers, and th...

Full description

Saved in:
Bibliographic Details
Published in:Journal of physics. D, Applied physics Applied physics, 2017-10, Vol.50 (48)
Main Authors: Takanashi, Koki, Mizuguchi, Masaki, Kojima, Takayuki, Tashiro, Takayuki
Format: Article
Language:English
Subjects:
FeNi
high magnetic anisotropy
magnetic damping constant
MBE
rare metal free
sputtering
thin films
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
Description
Summary:L10-ordered FeNi, showing high uniaxial magnetic anisotropy (Ku), is promising as a 'rare metal-free' high Ku material. We have worked on L10-ordered FeNi thin films prepared by two methods: one is molecular beam epitaxy (MBE) with alternate deposition of Fe and Ni monatomic layers, and the other is sputtering with co-deposition or multilayer-deposition of Fe and Ni followed by rapid thermal annealing (RTA). For the MBE films prepared by alternate monatomic layer deposition (leading to the stoichiometric composition: Fe 50 at.%- Ni 50 at.%), a clear relationship between Ku and the long-range order parameter S estimated by synchrotron x-ray diffraction (XRD) was found with maximum values of S  =  0.48 and Ku  =  7.0  ×  106 erg cm−3. The composition dependence of Ku was also investigated by deviating the thickness from monatomic layer, showing a maximum of 9.3  ×  106 erg cm−3 around 60 at.%Fe. In addition, the effect of Co addition to L10-ordered FeNi was investigated, suggesting that a small amount (
ISSN:0022-3727
1361-6463
DOI:10.1088/1361-6463/aa8ff6