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Oxidation of WS2 and WSe2 monolayers by ultraviolet-ozone treatment

We report the oxidation behavior of mechanically-exfoliated WS2 and WSe2 monolayers by ultraviolet-ozone treatment. After 1 min of ultraviolet-ozone treatment, photoluminescence and Raman measurement suggested the oxidation-induced doping of WS2 and WSe2. As the duration of ultraviolet-ozone treatme...

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Bibliographic Details
Published in:Journal of physics. D, Applied physics Applied physics, 2019-12, Vol.52 (50)
Main Authors: Kang, Minji, Yang, Hae In, Choi, Woong
Format: Article
Language:English
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Summary:We report the oxidation behavior of mechanically-exfoliated WS2 and WSe2 monolayers by ultraviolet-ozone treatment. After 1 min of ultraviolet-ozone treatment, photoluminescence and Raman measurement suggested the oxidation-induced doping of WS2 and WSe2. As the duration of ultraviolet-ozone treatment increased to 6 min, the quenching of photoluminescence and Raman spectra suggested severe oxidation of WS2 and WSe2. While x-ray photoelectron spectroscopy measurement suggested the oxidation of ultraviolet-ozone treated WS2 and WSe2 into WO2 or WO3, the formation of WO3 was confirmed by the measurement of transistor characterisitics of oxidized WS2 and WSe2. These results demonstrate that the oxidation behavior of WS2 and WSe2 monolayers significantly depends on the conditions of ultraviolet-ozone treatment, highlighting the importance of process optimization for the device integration of transition metal dichalcogenides including WS2 and WSe2.
ISSN:0022-3727
1361-6463
DOI:10.1088/1361-6463/ab42b0