Etching of Ga2O3: an important process for device manufacturing

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Bibliographic Details
Published in:Journal of physics. D, Applied physics Applied physics, 2024-12, Vol.57 (49)
Main Authors: Xi, Zhaoying, Liu, Zeng, Fang, Junpeng, Bian, Ang, Zhang, Shaohui, Zhang, Jia-Han, Li, Lei, Guo, Yufeng, Tang, Weihua
Format: Article
Language:English
Subjects:
device
etching
Online Access:Get full text
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ISSN:0022-3727
1361-6463
DOI:10.1088/1361-6463/ad773d