On the in-situ determination of the effective secondary electron emission coefficient in low pressure capacitively coupled radio frequency discharges based on the electrical asymmetry effect

• Published in: Journal of physics. D, Applied physics Applied physics, 2025-01, Vol.58 (4), p.45208
• Main Authors: Masheyeva, Ranna, Hartmann, Peter, Luo, Lan-Yue, Dzhumagulova, Karlygash, Liu, Yong-Xin, Schulze, Julian, Donkó, Zoltán
• Format: Article
• Language: English
• Subjects: capacitively coupled plasma; particle in cell simulation; secondary electron yield
• ISSN: 0022-3727; 1361-6463
• DOI: 10.1088/1361-6463/ad8bd5

We present a method for the in-situ determination of the effective secondary electron emission coefficient (SEEC, γ ) in a capacitively coupled plasma (CCP) source based on the γ -dependence of the DC self-bias voltage that develops over the plasma due to the electrical asymmetry effect (EAE). The EAE is established via the simultaneous application of two consecutive radio-frequency harmonics (with a varied phase angle) for the excitation of the discharge. Following the measurement of the DC self-bias voltage experimentally, particle-in-cell/Monte Carlo collision simulations coupled with a diffusion-reaction-radiation code to compute the argon atomic excited level dynamics are conducted with a sequence of SEEC values. The actual γ for the given discharge operating conditions is found by searching for the best match between the experimental and computed values of the DC self-bias voltage. The γ  ≈ 0.07 values obtained this way are in agreement with typical literature data for the working gas of argon and the electrode material of stainless steel in the CCP source. The method can be applied for a wider range of conditions, as well as for different electrode materials and gases to reveal the effective SEEC for various physical settings and discharge operating conditions.