Surface structure determination by x-ray standing waves at a free-electron laser

We demonstrate the structural sensitivity and accuracy of the x-ray standing wave technique at a high repetition rate free-electron laser, FLASH at DESY in Hamburg, by measuring the photoelectron yield from the surface SiO2 of Mo/Si multilayers. These experiments open up the possibility to obtain un...

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Bibliographic Details
Published in:New journal of physics 2019-03, Vol.21 (3), p.33031
Main Authors: Mercurio, G, Makhotkin, I A, Milov, I, Kim, Y Y, Zaluzhnyy, I A, Dziarzhytski, S, Wenthaus, L, Vartanyants, I A, Wurth, W
Format: Article
Language:English
Subjects:
Adsorbates
Chemical reactions
Free electron lasers
Multilayers
Organic chemistry
Photoelectrons
Physics
Silicon dioxide
Standing waves
Surface structure
Temporal resolution
x-ray standing waves
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Summary:We demonstrate the structural sensitivity and accuracy of the x-ray standing wave technique at a high repetition rate free-electron laser, FLASH at DESY in Hamburg, by measuring the photoelectron yield from the surface SiO2 of Mo/Si multilayers. These experiments open up the possibility to obtain unprecedented structural information of adsorbate and surface atoms with picometer spatial and femtosecond temporal resolution. This technique will substantially contribute to a fundamental understanding of chemical reactions at catalytic surfaces and the structural dynamics of superconductors.
ISSN:1367-2630
1367-2630
DOI:10.1088/1367-2630/aafa47