The role of RF sputtering parameters on the uniformity and stability of Tb4O7 thin films on silicon substrates for passivation applications

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Bibliographic Details
Published in:Physica scripta 2025-02, Vol.100 (2)
Main Authors: Sifawa, Abubakar A, Mohammad, Sabah M, Iliyasu, Usman, Abdullah, Mundzir, Shahrier, Md Rumon, Soomro, Aijaz Ali, Naser, Hameed
Format: Article
Language:English
Subjects:
AFM analysis
GIXRD pattern
optical properties
post-deposition annealing
RF sputtering
terbium oxide
Online Access:Get full text
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ISSN:0031-8949
1402-4896
DOI:10.1088/1402-4896/ada40a