Structure, phase evolution and properties of Ta films deposited using hybrid high-power pulsed and DC magnetron co-sputtering

• Published in: Chinese physics B 2022-05, Vol.31 (6), p.66101-635
• Main Authors: Huang, Min, Liu, Yan-Song, He, Zhi-Bing, Yi, Yong
• Format: Article
• Language: English
• Subjects: hardness; hybrid sputtering; structure; tantalum thin film
• ISSN: 1674-1056
• DOI: 10.1088/1674-1056/ac43a9

Crystalline phase and microstructure control are critical for obtaining desired properties of Ta films deposited by magnetron sputtering. Structure, phase evolution and properties of Ta films deposited by using hybrid high power impulse magnetron sputtering (HiPIMS) and direct current magnetron sputtering (DCMS) under different fractions of DCMS power were investigated, where Ta ion to Ta neutral ratios of the deposition flux were changed. The results revealed that the number of Ta ions arriving on the substrate/growing film plays an important role in structure and phase evolution of Ta films. It can effectively avoid the unstable arc discharge under low pressure and show a higher deposition rate by combining HiPIMS and DCMS compared with only HiPIMS. Meanwhile, the high hardness α -Ta films can be directly deposited by hybrid co-sputtering compared to those prepared by DCMS. In the co-sputtering technology, pure α -Ta phase films with extremely fine, dense and uniform crystal grains were obtained, which showed smooth surface roughness (3.22 nm), low resistivity (38.98 μΩ⋅cm) and abnormal high hardness (17.64 GPa).