Production of the thin carbon films using a Plasma Focus Installation

In the paper, the possibility of obtaining thin carbon (C) films on glass substrates using the Plasma focus installation is considered. The films were sprayed through a slit diaphragm made of graphite under the action of nitrogen plasma. The obtained films were inhomogeneous, which is due to the no...

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Bibliographic Details
Published in:Journal of physics. Conference series 2018-11, Vol.1134 (1), p.12027
Main Authors: Kolokoltsev, V N, Borovitskaya, I V, Maslyaev, S A, Degtyarev, V F
Format: Article
Language:English
Subjects:
Carbon
Energy distribution
Glass substrates
Nitrogen plasma
Plasma
Plasma focus
Plasma jets
Thin films
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Summary:In the paper, the possibility of obtaining thin carbon (C) films on glass substrates using the Plasma focus installation is considered. The films were sprayed through a slit diaphragm made of graphite under the action of nitrogen plasma. The obtained films were inhomogeneous, which is due to the no uniform energy distribution in the plasma jet. The measured transmission spectra and temperature dependences of the surface electrical resistivity (in the temperature range 78-300K) indicate the cluster formation of films on glass substrates. At 300K, the resistance of the films with is from 105 to 107 Ohms.
ISSN:1742-6588
1742-6596
DOI:10.1088/1742-6596/1134/1/012027