Study of the bias voltage influence on the structure, texture and residual stresses in Ta coatings deposited on a copper substrate of inverted magnetron

The results of the study of the bias voltage effect on the structure, texture and residual stresses of Ta-coatings deposited using an inverted magnetron on a copper substrate are presented. It is shown that variations in residual stresses are non-monotonic, which is determined by the complex effect...

Full description

Saved in:
Bibliographic Details
Published in:Journal of physics. Conference series 2019-11, Vol.1396 (1), p.12028
Main Authors: Lenkovets, A S, Lozovan, A A, Betsofen, S Ya, Bespalov, A V, Grushin, I A, Ivanov, N A
Format: Article
Language:English
Subjects:
Bias
Coatings
Copper
Electric potential
Physics
Residual stress
Stress relaxation
Substrates
Texture
Thermal stress
Voltage
Citations: Items that this one cites
Items that cite this one
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
Description
Summary:The results of the study of the bias voltage effect on the structure, texture and residual stresses of Ta-coatings deposited using an inverted magnetron on a copper substrate are presented. It is shown that variations in residual stresses are non-monotonic, which is determined by the complex effect of the bias voltage on the process temperature, which affects both the formation of mechanical and thermal stresses and their partial relaxation.
ISSN:1742-6588
1742-6596
DOI:10.1088/1742-6596/1396/1/012028