Controlled Ultra-Thin Suboxide Films Generation in Metal-Oxide Systems by Ar+ Ion Irradiation

A method of controlled generation of metal suboxide films is proposed, basing on low-current ion sputtering of native oxides of ultra-thin metallic films and XPS chemical and phase depth profiling. Niobium suboxide ultra-thin films are generated and controlled using this approach.

Saved in:
Bibliographic Details
Published in:Journal of physics. Conference series 2020-12, Vol.1695 (1), p.12025
Main Authors: Lubenchenko, A V, Lukyantsev, D S, Pavolotsky, A B, Ivanov, D A, Lubenchenko, O I, Ivanova, I V, Iachuk, V A, Pavlov, O N
Format: Article
Language:English
Subjects:
Depth profiling
Ion irradiation
Metal films
Metal oxides
Niobium
Physics
Thin films
Citations: Items that this one cites
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
Description
Summary:A method of controlled generation of metal suboxide films is proposed, basing on low-current ion sputtering of native oxides of ultra-thin metallic films and XPS chemical and phase depth profiling. Niobium suboxide ultra-thin films are generated and controlled using this approach.
ISSN:1742-6588
1742-6596
1742-6596
DOI:10.1088/1742-6596/1695/1/012025