Development of front contact grid for GaP/Si solar cells

A scalable technology for applying metallization to GaP/Si photovoltaic structures for mass production was explored. The study of Ag-based contacts, which are obtained by screen-printing of silver past followed by subsequent annealing, are presented in this paper. Contact resistance measurements are...

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Bibliographic Details
Published in:Journal of physics. Conference series 2020-12, Vol.1695 (1), p.12081
Main Authors: Bogdanova, M V, Morozov, I A, Gudovskih, A S
Format: Article
Language:English
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Summary:A scalable technology for applying metallization to GaP/Si photovoltaic structures for mass production was explored. The study of Ag-based contacts, which are obtained by screen-printing of silver past followed by subsequent annealing, are presented in this paper. Contact resistance measurements are done using the TLM method. The developed contacts have demonstrated excellent performance even in comparison with the vacuum deposition technology, which is the basis for using the developed technology of forming contacts in industry.
ISSN:1742-6588
1742-6596
DOI:10.1088/1742-6596/1695/1/012081