Surface morphology of nanostructured zinc oxide materials obtained by plasma-enhanced chemical vapor deposition

Zinc oxide nanostructures have been obtained by plasma-enhanced chemical vapor deposition technique. High-purity elemental zinc was used as the precursor. RF (40MHz) inductively coupled plasma discharge was used for the initiation of the plasma-chemical reactions in the gas phase. Hydrogen-oxygen (H...

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Bibliographic Details
Published in:Journal of physics. Conference series 2021-07, Vol.1967 (1), p.12049
Main Authors: Mochalov, L A, Logunov, A A, Prokhorov, I O
Format: Article
Language:English
Subjects:
Atomic force microscopy
Chemical reactions
Chemical vapor deposition
Gas mixtures
Inductively coupled plasma
Morphology
Optical emission spectroscopy
Plasma
Plasma enhanced chemical vapor deposition
Plasma jets
Substrates
Vapor phases
Zinc oxide
Zinc oxides
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Summary:Zinc oxide nanostructures have been obtained by plasma-enhanced chemical vapor deposition technique. High-purity elemental zinc was used as the precursor. RF (40MHz) inductively coupled plasma discharge was used for the initiation of the plasma-chemical reactions in the gas phase. Hydrogen-oxygen (H 2 -O 2 ) composition of various ratios was used as the source plasma gas mixture. The optical emission spectroscopy was used as the powerful tool to determine the intermediate excited particles and assume the possible mechanism of the plasma-chemical reactions. The paper also investigates the influence of the substrate’s materials, its temperature, and the power of the heat input into the discharge. The properties of the sprayed materials were characterized by the method of atomic force microscopy.
ISSN:1742-6588
1742-6596
DOI:10.1088/1742-6596/1967/1/012049