Influence of nitrogen ratios on rutile to anatase phase transition of titanium oxynitride thin films deposited via reactive magnetron sputtering

Thin films of titanium oxynitride deposited via reactive direct current (DC) magnetron sputtering method followed by annealing treatment at 500 °C for crystallization improvement. The thin films were grown under the Ar/O 2 /N 2 gases mixture by various nitrogen ratios. The crystalline structure, sur...

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Bibliographic Details
Published in:Journal of physics. Conference series 2021-09, Vol.2013 (1), p.12006
Main Authors: Khwansungnoen, Phalakorn, Choeysuppaket, Attapol, Rattana, Tanattha
Format: Article
Language:English
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Summary:Thin films of titanium oxynitride deposited via reactive direct current (DC) magnetron sputtering method followed by annealing treatment at 500 °C for crystallization improvement. The thin films were grown under the Ar/O 2 /N 2 gases mixture by various nitrogen ratios. The crystalline structure, surface morphology, and optical properties of the obtained thin films were investigated by X-ray diffraction (XRD), scanning electron microscope (SEM), and ultraviolet-visible spectrophotometer, respectively. The rutile to anatase phase transition could be detected that increased with increasing the nitrogen ratio and also affected the crystallite size and the thickness of the thin films. The optical bandgap evaluated by the Tauc plot is in the range of 2.78–3.17 eV.
ISSN:1742-6588
1742-6596
DOI:10.1088/1742-6596/2013/1/012006