Comparing the methods of copper substrate polishing for CVD graphene synthesis

This paper presents a comparison of chemical and plasma electrolyte polishing methods for preparing a copper substrate for graphene synthesis by chemical vapour deposition. It is shown that in order to achieve the most uniform morphology of the surface of the copper substrate, it is preferable to us...

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Bibliographic Details
Published in:Journal of physics. Conference series 2021-10, Vol.2057 (1), p.12121
Main Authors: Kostogrud, I A, Boyko, E V, Matochkin, P E, Sorokin, D V
Format: Article
Language:English
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Summary:This paper presents a comparison of chemical and plasma electrolyte polishing methods for preparing a copper substrate for graphene synthesis by chemical vapour deposition. It is shown that in order to achieve the most uniform morphology of the surface of the copper substrate, it is preferable to use the electrolyte-plasma polishing method. With its help, the proportion of multilayer regions in the graphene coating obtained as a result of CVD synthesis decreases. The obtained results may serve a recommendation for creating a graphene coating with specified parameters.
ISSN:1742-6588
1742-6596
DOI:10.1088/1742-6596/2057/1/012121