Cutoff limitation of left-hand polarization wave and candidates for further enhanced producing multicharged ions on ECRIS

Based on experimentally obtained plasma parameters in an electron cyclotron resonance (ECR) ion source (ECRIS) and theoretical considerations, it is turned out the essential factor that is currently presumed to define the increase in multicharged ion current in ECRIS is not simply the density limit...

Full description

Saved in:
Bibliographic Details
Published in:Journal of physics. Conference series 2022-04, Vol.2244 (1), p.12001
Main Authors: Kato, Y, Kubo, W, Harisaki, S, Anan, M, Tsuda, K, Sato, K, Owada, I, Maenaka, T
Format: Article
Language:English
Subjects:
Cyclotron resonance
Density
Electron cyclotron resonance
Electrostatic waves
Field strength
Ion currents
Ion sources
Ions
Parameters
Physics
Citations: Items that this one cites
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
Description
Summary:Based on experimentally obtained plasma parameters in an electron cyclotron resonance (ECR) ion source (ECRIS) and theoretical considerations, it is turned out the essential factor that is currently presumed to define the increase in multicharged ion current in ECRIS is not simply the density limit of ordinary wave and right-hand cutoffs, but is also higher density one of left-hand cutoff. There are two response guidelines that can be considered to make it possible to overcome limitations, except for the conventional simply increasing the frequency and the magnetic field strength. One is advanced high-frequency resonance, i.e. , upper-hybrid resonance (UHR), which is conversion from electromagnetic to electrostatic wave essentially without cutoff. The others are due to the introduction of lower frequency waves than ECR’s one, which has no density limit in a more essential sense. The latter is the introduction of lower-hybrid resonance (LHR) or ion cyclotron resonance (ICR). We will describe experimentally obtained plasma parameters, and will discuss these candidate applications.
ISSN:1742-6588
1742-6596
DOI:10.1088/1742-6596/2244/1/012001