Investigation of a high-frequency magnetron sputtering system operation modes during copper thin films deposition

The results of studying the radio frequency (RF) magnetron sputtering (MS) operation parameters during copper sputtering are presented. A comparison of the growth rate dependence on power during the operation of MS is made in RF and DC modes. The pressure dependences of the RFMS growth rate and bias...

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Bibliographic Details
Published in:Journal of physics. Conference series 2022-05, Vol.2270 (1), p.12055
Main Authors: Tumanov, N A, Kirillov, D V, Vorob’ev, E V
Format: Article
Language:English
Subjects:
Copper
Deposition
Magnetron sputtering
Physics
Radio frequency
Thin films
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Summary:The results of studying the radio frequency (RF) magnetron sputtering (MS) operation parameters during copper sputtering are presented. A comparison of the growth rate dependence on power during the operation of MS is made in RF and DC modes. The pressure dependences of the RFMS growth rate and bias target voltage are obtained. The prospect of using RFMS for deposition of smooth coatings is shown.
ISSN:1742-6588
1742-6596
DOI:10.1088/1742-6596/2270/1/012055