Influence of ion-plasma treatment on residual stress in the microcantilever

The influence of ion-plasma treatment on residual stress in the microcantilever is investigated. The ability of treatment with energy below the sputtering threshold to affect the mechanical stress is shown. It is also demonstrated that a preliminary vacuum thermal annealing of samples reduces the in...

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Bibliographic Details
Published in:Journal of physics. Conference series 2016-08, Vol.741 (1), p.12208
Main Authors: Babushkin, A S, Uvarov, I V, Amirov, I I
Format: Article
Language:English
Subjects:
Annealing
Ion bombardment
Physics
Residual stress
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Summary:The influence of ion-plasma treatment on residual stress in the microcantilever is investigated. The ability of treatment with energy below the sputtering threshold to affect the mechanical stress is shown. It is also demonstrated that a preliminary vacuum thermal annealing of samples reduces the influence of ion bombardment on the residual stress. With the increase of the annealing temperature the effect of ion bombardment disappears.
ISSN:1742-6588
1742-6596
1742-6596
DOI:10.1088/1742-6596/741/1/012208