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Consequences of N2 gas flow variation on properties of zirconium oxide-nitride films

Zirconium oxide-nitride films was prepared by RF reactive magnetron sputtering in presence of helium, oxygen and nitrogen gases. The N2 gas flow rate was varied for each consecutive run of sputtering at values of 66, 72, 78, 84, and 90 sccm respectively. Zirconium oxide-nitride films showed structur...

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Bibliographic Details
Published in:IOP conference series. Materials Science and Engineering 2016-10, Vol.149 (1)
Main Authors: Jariwala, Nayan N., Chauhan, Kamlesh V., Pandya, Parth P., Patel, Nicky P., Rawal, Sushant K.
Format: Article
Language:English
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Summary:Zirconium oxide-nitride films was prepared by RF reactive magnetron sputtering in presence of helium, oxygen and nitrogen gases. The N2 gas flow rate was varied for each consecutive run of sputtering at values of 66, 72, 78, 84, and 90 sccm respectively. Zirconium oxide-nitride films showed structural variation in evolution of various textures as detected by X-ray diffraction. It showed good transmission values above 50% for all samples. Wettability studies of zirconium oxide-nitride films was done by contact angle goniometer. All samples depict hydrophobic behaviour as all films have contact angle values above 90° and as nitrogen gas flow rate increases, the films roughness as well as contact angle increases. Tribological test is done on zirconium oxide-nitride films coated on aluminium, brass and mild steel pins, which give excellent wear resistance compared to uncoated pins.
ISSN:1757-8981
1757-899X
DOI:10.1088/1757-899X/149/1/012058