Effect of sputtering power on the microstructure of Mg doped ZnO thin films

In this paper, Mg doped ZnO thin films were prepared on glass substrates by RF magnetron sputtering. The surface morphology, composition, structure, thickness and refractive index of the films were studied by SEM, XRD and ellipsometer. The results show that the sputtering power has no great influenc...

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Bibliographic Details
Published in:IOP conference series. Materials Science and Engineering 2020-07, Vol.892 (1), p.12020
Main Authors: Cheng, Zhen, Meng, Yu, Zhang, Bianlian
Format: Article
Language:English
Subjects:
Glass substrates
Grain size
Magnesium
Magnetron sputtering
Morphology
Refractivity
Thickness
Thin films
Zinc oxide
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Summary:In this paper, Mg doped ZnO thin films were prepared on glass substrates by RF magnetron sputtering. The surface morphology, composition, structure, thickness and refractive index of the films were studied by SEM, XRD and ellipsometer. The results show that the sputtering power has no great influence on the growth direction of the film. When the sputtering power changes from 40 W to 100 W, the crystalline state of the film becomes better, the grain size and the thickness and the refractive index of the film increase with the rising of the sputtering power.
ISSN:1757-8981
1757-899X
DOI:10.1088/1757-899X/892/1/012020