Improvement of corrosion resistance and mechanical properties of chrome plating by diamond-like carbon coating with different silicon-based interlayers

• Published in: Materials research express 2022-05, Vol.9 (5), p.55604
• Main Authors: Lakhonchai, Anthika, Chingsungnoen, Artit, Poolcharuansin, Phitsanu, Chanlek, Narong, Tunmee, Sarayut, Rittihong, Ukit
• Format: Article
• Language: English
• Subjects: adhesive properties; Adhesive strength; Bonding strength; Chemical vapor deposition; chrome plating; Chromium plating; Corrosion currents; Corrosion resistance; corrosive properties; Diamond films; Diamond-like carbon; Diamond-like carbon films; Direct current; Electrochemical corrosion; Field emission microscopy; Field emission spectroscopy; Interlayers; Magnetron sputtering; Mechanical properties; Nanoindentation; Photoelectrons; Photovoltaic cells; Protective coatings; radio frequency-plasma chemical vapor deposition; Raman spectroscopy; Scratching; Service life; silicon-based interlayers; Spectrum analysis; Thickness
• ISSN: 2053-1591; 2053-1591
• DOI: 10.1088/2053-1591/ac69b5

In this study, the silicon-based interlayers for hydrogenated amorphous carbon (a-C:H) coating on a chromium-plated substrate are presented. The a-Si, a-Si:N, a-Si:H and a-Si x C y :H interlayers with a thickness of about 306 nm were deposited by direct current magnetron sputtering technique. The a-C:H films with a thickness of about 317 nm was prepared as a top layer by radio frequency-plasma chemical vapor deposition. The a-C:H films with silicon-based interlayers were characterized by x-ray photoelectron spectroscopy, Raman spectroscopy, field emission-secondary electron microscopy, nanoindentation, micro-scratching, and electrochemical corrosion measurements in terms of their structure, morphology, mechanical and adhesive properties, and corrosion resistance. The a-C:H films with an a-Si:H interlayer exhibit the lowest corrosion current density, which is about 36 times lower than that of the uncoated chromium-plated substrate. In addition, the hardness increases from 8.48 GPa for the uncoated substrate to 20.98 GPa for the a-C:H/a-Si:H sample. The mixing with hydrogen gas could reduce the residual oxygen during the deposition process, which could reduce the Si–O bonding and improve the adhesion strength between the a-C:H film and the a-Si:H interlayer and the a-Si:H interlayer and the substrate. Therefore, it can be concluded that the protective a-C:H coating with an a-Si:H interlayer has excellent potential to significantly improve the durability and extend the service life of materials used in abrasive and corrosive environments.