Fabrication of Semi-Invasive Micro-Needle Array Using Gradation Exposure

The authors have been investigating a methodology to fabricate a micro-needle array on a thin plastic film for clinical use. The lithography-based approach can be used to produce micro-needle arrays. The purpose of this research is to demonstrate a methodology for etching silicon to particular requi...

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Main Authors: Yamaguchi, Masaki, Sasaki, Yugo, Kimura, Yuta, Sasaki, Makoto, Nakayama, Yuki
Format: Conference Proceeding
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creator Yamaguchi, Masaki
Sasaki, Yugo
Kimura, Yuta
Sasaki, Makoto
Nakayama, Yuki
description The authors have been investigating a methodology to fabricate a micro-needle array on a thin plastic film for clinical use. The lithography-based approach can be used to produce micro-needle arrays. The purpose of this research is to demonstrate a methodology for etching silicon to particular required depths which can be used in designing structures to manufacture a mold for polymers. A grey-scale photolithography technique was demonstrated using deep reactive ion etching (DRIE). The whole photo-lithography process was carried out in two steps: (i) a photoresist pattern was transferred into silicon dioxide using a layout mask, (ii) a silicon mold was formed using exposure through the use of gradation mask and DRIE. The etch selectivity to the resist was 8.1 and the maximum relative depth was 30 μm.
doi_str_mv 10.1149/05028.0039ecst
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title Fabrication of Semi-Invasive Micro-Needle Array Using Gradation Exposure
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