Study of Mass Transport for Efficient Fluid Processing

Cleaning processes as well as other liquid processes such as etching typically involve contact between a solid surface and a processing fluid. Typically the fluid flows along the surface of the substrate. Not in all cases this results in an enhancement of the process involved. The current study aims...

Full description

Saved in:
Bibliographic Details
Main Authors: Mertens, Paul W., Haslinger, Michael, Soha, Marton, John, Joachim
Format: Conference Proceeding
Language:English
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
cited_by
cites
container_end_page 79
container_issue 2
container_start_page 73
container_title
container_volume 80
creator Mertens, Paul W.
Haslinger, Michael
Soha, Marton
John, Joachim
description Cleaning processes as well as other liquid processes such as etching typically involve contact between a solid surface and a processing fluid. Typically the fluid flows along the surface of the substrate. Not in all cases this results in an enhancement of the process involved. The current study aims at providing deeper insight into the mass transport in order to be able to better optimize cost-effectiveness of the fluid processes. This studies focusses on the mass transport through the fluid, particularly for the case of a laminar flow along the wafer surface An analytical expression is proposed that presents a flow threshold above which the mass transport can be enhanced by a laminar flow.
doi_str_mv 10.1149/08002.0073ecst
format conference_proceeding
fullrecord <record><control><sourceid>iop_cross</sourceid><recordid>TN_cdi_iop_journals_10_1149_08002_0073ecst</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>10.1149/08002.0073ecst</sourcerecordid><originalsourceid>FETCH-LOGICAL-c229t-7751b8eb7df89817774de062615a61d567ef4cc9247e93fda64ebc94fd41a8c13</originalsourceid><addsrcrecordid>eNp1jz1PwzAURS0EEqWwMntGSrEdx88eUdUCUhFIlNly_IFclTiyk6H_nkDLyPTu8M7VPQjdUrKglKt7IglhC0Kg9rYMZ2hGVS0rATWcn3IjBbtEV6XsCBETAzMk3ofRHXAK-MWUgrfZdKVPecAhZbwKIdrouwGv92N0-C0n60uJ3ec1ughmX_zN6c7Rx3q1XT5Vm9fH5-XDprKMqaECaGgrfQsuSCUpAHDniWCCNkZQ1wjwgVurGAev6uCM4L61igfHqZGW1nO0OPbanErJPug-xy-TD5oS_WOtf631n_UE3B2BmHq9S2Pupnn_PX8DGHxYGA</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>conference_proceeding</recordtype></control><display><type>conference_proceeding</type><title>Study of Mass Transport for Efficient Fluid Processing</title><source>Institute of Physics</source><creator>Mertens, Paul W. ; Haslinger, Michael ; Soha, Marton ; John, Joachim</creator><creatorcontrib>Mertens, Paul W. ; Haslinger, Michael ; Soha, Marton ; John, Joachim</creatorcontrib><description>Cleaning processes as well as other liquid processes such as etching typically involve contact between a solid surface and a processing fluid. Typically the fluid flows along the surface of the substrate. Not in all cases this results in an enhancement of the process involved. The current study aims at providing deeper insight into the mass transport in order to be able to better optimize cost-effectiveness of the fluid processes. This studies focusses on the mass transport through the fluid, particularly for the case of a laminar flow along the wafer surface An analytical expression is proposed that presents a flow threshold above which the mass transport can be enhanced by a laminar flow.</description><identifier>ISSN: 1938-5862</identifier><identifier>ISSN: 1938-6737</identifier><identifier>EISSN: 1938-6737</identifier><identifier>EISSN: 1938-5862</identifier><identifier>DOI: 10.1149/08002.0073ecst</identifier><language>eng</language><publisher>The Electrochemical Society, Inc</publisher><ispartof>ECS transactions, 2017, Vol.80 (2), p.73-79</ispartof><rights>2017 ECS - The Electrochemical Society</rights><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,776,780,27903,27904</link.rule.ids></links><search><creatorcontrib>Mertens, Paul W.</creatorcontrib><creatorcontrib>Haslinger, Michael</creatorcontrib><creatorcontrib>Soha, Marton</creatorcontrib><creatorcontrib>John, Joachim</creatorcontrib><title>Study of Mass Transport for Efficient Fluid Processing</title><title>ECS transactions</title><addtitle>ECS Trans</addtitle><description>Cleaning processes as well as other liquid processes such as etching typically involve contact between a solid surface and a processing fluid. Typically the fluid flows along the surface of the substrate. Not in all cases this results in an enhancement of the process involved. The current study aims at providing deeper insight into the mass transport in order to be able to better optimize cost-effectiveness of the fluid processes. This studies focusses on the mass transport through the fluid, particularly for the case of a laminar flow along the wafer surface An analytical expression is proposed that presents a flow threshold above which the mass transport can be enhanced by a laminar flow.</description><issn>1938-5862</issn><issn>1938-6737</issn><issn>1938-6737</issn><issn>1938-5862</issn><fulltext>true</fulltext><rsrctype>conference_proceeding</rsrctype><creationdate>2017</creationdate><recordtype>conference_proceeding</recordtype><recordid>eNp1jz1PwzAURS0EEqWwMntGSrEdx88eUdUCUhFIlNly_IFclTiyk6H_nkDLyPTu8M7VPQjdUrKglKt7IglhC0Kg9rYMZ2hGVS0rATWcn3IjBbtEV6XsCBETAzMk3ofRHXAK-MWUgrfZdKVPecAhZbwKIdrouwGv92N0-C0n60uJ3ec1ughmX_zN6c7Rx3q1XT5Vm9fH5-XDprKMqaECaGgrfQsuSCUpAHDniWCCNkZQ1wjwgVurGAev6uCM4L61igfHqZGW1nO0OPbanErJPug-xy-TD5oS_WOtf631n_UE3B2BmHq9S2Pupnn_PX8DGHxYGA</recordid><startdate>20170815</startdate><enddate>20170815</enddate><creator>Mertens, Paul W.</creator><creator>Haslinger, Michael</creator><creator>Soha, Marton</creator><creator>John, Joachim</creator><general>The Electrochemical Society, Inc</general><scope>AAYXX</scope><scope>CITATION</scope></search><sort><creationdate>20170815</creationdate><title>Study of Mass Transport for Efficient Fluid Processing</title><author>Mertens, Paul W. ; Haslinger, Michael ; Soha, Marton ; John, Joachim</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c229t-7751b8eb7df89817774de062615a61d567ef4cc9247e93fda64ebc94fd41a8c13</frbrgroupid><rsrctype>conference_proceedings</rsrctype><prefilter>conference_proceedings</prefilter><language>eng</language><creationdate>2017</creationdate><toplevel>online_resources</toplevel><creatorcontrib>Mertens, Paul W.</creatorcontrib><creatorcontrib>Haslinger, Michael</creatorcontrib><creatorcontrib>Soha, Marton</creatorcontrib><creatorcontrib>John, Joachim</creatorcontrib><collection>CrossRef</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Mertens, Paul W.</au><au>Haslinger, Michael</au><au>Soha, Marton</au><au>John, Joachim</au><format>book</format><genre>proceeding</genre><ristype>CONF</ristype><atitle>Study of Mass Transport for Efficient Fluid Processing</atitle><btitle>ECS transactions</btitle><addtitle>ECS Trans</addtitle><date>2017-08-15</date><risdate>2017</risdate><volume>80</volume><issue>2</issue><spage>73</spage><epage>79</epage><pages>73-79</pages><issn>1938-5862</issn><issn>1938-6737</issn><eissn>1938-6737</eissn><eissn>1938-5862</eissn><abstract>Cleaning processes as well as other liquid processes such as etching typically involve contact between a solid surface and a processing fluid. Typically the fluid flows along the surface of the substrate. Not in all cases this results in an enhancement of the process involved. The current study aims at providing deeper insight into the mass transport in order to be able to better optimize cost-effectiveness of the fluid processes. This studies focusses on the mass transport through the fluid, particularly for the case of a laminar flow along the wafer surface An analytical expression is proposed that presents a flow threshold above which the mass transport can be enhanced by a laminar flow.</abstract><pub>The Electrochemical Society, Inc</pub><doi>10.1149/08002.0073ecst</doi><tpages>7</tpages></addata></record>
fulltext fulltext
identifier ISSN: 1938-5862
ispartof ECS transactions, 2017, Vol.80 (2), p.73-79
issn 1938-5862
1938-6737
1938-6737
1938-5862
language eng
recordid cdi_iop_journals_10_1149_08002_0073ecst
source Institute of Physics
title Study of Mass Transport for Efficient Fluid Processing
url http://sfxeu10.hosted.exlibrisgroup.com/loughborough?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-22T23%3A09%3A15IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-iop_cross&rft_val_fmt=info:ofi/fmt:kev:mtx:book&rft.genre=proceeding&rft.atitle=Study%20of%20Mass%20Transport%20for%20Efficient%20Fluid%20Processing&rft.btitle=ECS%20transactions&rft.au=Mertens,%20Paul%20W.&rft.date=2017-08-15&rft.volume=80&rft.issue=2&rft.spage=73&rft.epage=79&rft.pages=73-79&rft.issn=1938-5862&rft.eissn=1938-6737&rft_id=info:doi/10.1149/08002.0073ecst&rft_dat=%3Ciop_cross%3E10.1149/08002.0073ecst%3C/iop_cross%3E%3Cgrp_id%3Ecdi_FETCH-LOGICAL-c229t-7751b8eb7df89817774de062615a61d567ef4cc9247e93fda64ebc94fd41a8c13%3C/grp_id%3E%3Coa%3E%3C/oa%3E%3Curl%3E%3C/url%3E&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true