Electrochemical Deposition of Ni into Mesoporous Silicon

Nickel nanowires have been formed by the stationary electrochemical deposition of nickel into mesoporous silicon from the modified Watts bath. The polycrystalline nature of the Ni deposit has been established as well as expansion of its lattice parameter in comparison with bulk nickel. Control of th...

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Bibliographic Details
Published in:ECS transactions 2012-05, Vol.41 (35), p.111-118
Main Authors: Dolgyi, Alexey, Bandarenka, Hanna, Prischepa, Serghej, Yanushkevich, Kazimir, Nenzi, Paolo, Balucani, Marco, Bondarenko, Vitaly
Format: Article
Language:English
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Summary:Nickel nanowires have been formed by the stationary electrochemical deposition of nickel into mesoporous silicon from the modified Watts bath. The polycrystalline nature of the Ni deposit has been established as well as expansion of its lattice parameter in comparison with bulk nickel. Control of the potential of porous silicon during electrochemical deposition allows to determine the moment of complete filling of pore space with Ni. The maximum achieved filling factor was 67% of the pores. The pore dimensions have been found to define the length and the diameter of the Ni nanowires that have equaled to 10 um and 100-120 nm, respectively.
ISSN:1938-5862
1938-6737
DOI:10.1149/1.3699385