Effects of Low Boron Concentration on Electrical Properties of Commercial Trap-Rich High Resistivity SOI Substrate

Electrical properties of boron lightly doped trap-rich layers of trap-rich high resistivity silicon-on-insulator (trap-rich HR-SOI) substrates are investigated. Secondary Ion Mass Spectroscopy (SIMS) is used to measure boron distribution. Resistivity profiles are studied by means of Spreading-resist...

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Published in:ECS journal of solid state science and technology 2018-01, Vol.7 (2), p.P35-P37
Main Authors: Zhu, Lei, Chang, Yongwei, Gao, Nan, Su, Xin, Dong, Yemin, Fei, Lu, Wei, Xing, Wang, Xi
Format: Article
Language:English
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Summary:Electrical properties of boron lightly doped trap-rich layers of trap-rich high resistivity silicon-on-insulator (trap-rich HR-SOI) substrates are investigated. Secondary Ion Mass Spectroscopy (SIMS) is used to measure boron distribution. Resistivity profiles are studied by means of Spreading-resistance profiling (SRP). Moreover, radio frequency (RF) performance of the trap-rich HR-SOI substrates is evaluated using coplanar waveguide (CPW) lines. It is found that RF losses and harmonic distortions keep unchanged when boron concentration of the trap-rich layer is lower than 5 × 1014 cm−3. It is suggested that the trap-rich layer can still effectively restrain the parasitic surface conductance (PSC) effect.
ISSN:2162-8769
2162-8769
2162-8777
DOI:10.1149/2.0061802jss