Electrochemical Polishing Applications and EIS of a Vitamin B4-Based Ionic Liquid

• Published in: Journal of the Electrochemical Society 2013-01, Vol.160 (3), p.E22-E26
• Main Authors: Wixtrom, Alex I., Buhler, Jessica E., Reece, Charles E., Abdel-Fattah, Tarek M.
• Format: Article
• Language: English
• ISSN: 0013-4651
• DOI: 10.1149/2.013303jes

Modern particle accelerators require minimal interior surface roughness for Niobium superconducting radio frequency (SRF) cavities. Polishing of the Nb is currently achieved via electrochemical polishing with concentrated mixtures of sulfuric and hydrofluoric acids. This acid-based approach is effective at reducing the surface roughness to acceptable levels for SRF use, but due to acid-related hazards and extra costs (including safe disposal of used polishing solutions), an acid-free method would be preferable. This study focuses on an alternative electrochemical polishing method for Nb, using a novel ionic liquid solution containing choline chloride, also known as Vitamin B4 (VB4). Potentiostatic electrochemical impedance spectroscopy (EIS) was also performed on the VB4-based system. Nb polished using the VB4-based method was found to have a final surface roughness comparable to that achieved via the acid-based method, as assessed by atomic force microscopy (AFM). These findings indicate that acid-free VB4-based electrochemical polishing of Nb represents a promising replacement for acid-based methods of SRF cavity preparation.