Importance of crystallinity improvement in MoS2 film by compound sputtering even followed by post sulfurization

The MoS2 film for chip-size area was synthesized by two step processes consisting of MoS2-compound sputtering and post sulfurization. We intentionally revealed that the crystallinity of sulfurized MoS2 film depends on that of just-after-sputtered film. Therefore, a crystallinity improvement just-aft...

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Bibliographic Details
Published in:Japanese Journal of Applied Physics 2021-05, Vol.60 (SB)
Main Authors: Imai, Shinya, Hamada, Takuya, Hamada, Masaya, Shirokura, Takanori, Muneta, Iriya, Kakushima, Kuniyuki, Tatsumi, Tetsuya, Tomiya, Shigetaka, Tsutsui, Kazuo, Wakabayashi, Hitoshi
Format: Article
Language:English
Subjects:
2D material
Crystal structure
Crystallinity
Molybdenum disulfide
MoS
post sulfurization
Sputtering
Sulfurization
Thin films
TMDC
Transistors
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Summary:The MoS2 film for chip-size area was synthesized by two step processes consisting of MoS2-compound sputtering and post sulfurization. We intentionally revealed that the crystallinity of sulfurized MoS2 film depends on that of just-after-sputtered film. Therefore, a crystallinity improvement just-after sputtering is mandatory to achieve an excellent quality MoS2 film after sulfur-vapor annealing for thin film transistor, sensor and human interface device applications.
ISSN:0021-4922
1347-4065
DOI:10.35848/1347-4065/abdcae