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A method for exfoliating AlGaN films from sapphire substrates using heated and pressurized water
Thin films of AlN, AlGaN, and AlGaN-based device structures of approximately 1 cm 2 formed on a sapphire substrate were successfully exfoliated from the substrate by immersion in heated (115 °C) and pressurized (170 kPa) water. These thin films were crystalline, grown on periodically formed AlN nano...
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Published in: | Applied physics express 2022-11, Vol.15 (11), p.116502 |
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creator | Matsubara, Eri Hasegawa, Ryota Nishibayashi, Toma Yabutani, Ayumu Yamada, Ryoya Imoto, Yoshinori Kondo, Ryosuke Iwayama, Sho Takeuchi, Tetsuya Kamiyama, Satoshi Shojiki, Kanako Kumagai, Shinya Miyake, Hideto Iwaya, Motoaki |
description | Thin films of AlN, AlGaN, and AlGaN-based device structures of approximately 1 cm
2
formed on a sapphire substrate were successfully exfoliated from the substrate by immersion in heated (115 °C) and pressurized (170 kPa) water. These thin films were crystalline, grown on periodically formed AlN nanopillars. The water was permeated through intentional voids formed in the AlGaN or AlN crystalline layers by using periodic AlN nanopillars. The exfoliated AlGaN exhibited clear X-ray diffraction peaks from its (0002) plane diffraction. Transmission electron microscopy (TEM) confirmed that exfoliation introduced few additional dislocations and that the device structure was maintained. |
doi_str_mv | 10.35848/1882-0786/ac97dc |
format | article |
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formed on a sapphire substrate were successfully exfoliated from the substrate by immersion in heated (115 °C) and pressurized (170 kPa) water. These thin films were crystalline, grown on periodically formed AlN nanopillars. The water was permeated through intentional voids formed in the AlGaN or AlN crystalline layers by using periodic AlN nanopillars. The exfoliated AlGaN exhibited clear X-ray diffraction peaks from its (0002) plane diffraction. Transmission electron microscopy (TEM) confirmed that exfoliation introduced few additional dislocations and that the device structure was maintained.</description><subject>AlGaN</subject><subject>AlN nanopillars</subject><subject>heated and pressurized water</subject><subject>substrate exfoliation</subject><issn>1882-0778</issn><issn>1882-0786</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2022</creationdate><recordtype>article</recordtype><recordid>eNp9kE9LAzEQxYMoWKsfwFuuHtbmz242PZaiVSh60XOc3SQ2ZbdZkl2sfnpTV3oSYWDmPd4Mww-ha0pueSFzOaNSsoyUUsygnpe6PkGTo3V6nEt5ji5i3BIick7FBL0tcGv6jdfY-oDN3vrGQe9273jRrOAJW9e0EdvgWxyh6zYuGByHKvYBehPxEA_RjUlCY9hp3AUT4xDcV9IfyQ2X6MxCE83Vb5-i1_u7l-VDtn5ePS4X66zmkveZEFpqyzQBBgZoYecEqKFUUllZYmooWZVLqKhgmhNRMJ5zUopcp2yl64pPER3v1sHHGIxVXXAthE9FifpBpA4M1IGHGhGlnWzccb5TWz-EXfrw3_zNH3nozF7RQlGaShSEqU5b_g0kOXhO</recordid><startdate>20221101</startdate><enddate>20221101</enddate><creator>Matsubara, Eri</creator><creator>Hasegawa, Ryota</creator><creator>Nishibayashi, Toma</creator><creator>Yabutani, Ayumu</creator><creator>Yamada, Ryoya</creator><creator>Imoto, Yoshinori</creator><creator>Kondo, Ryosuke</creator><creator>Iwayama, Sho</creator><creator>Takeuchi, Tetsuya</creator><creator>Kamiyama, Satoshi</creator><creator>Shojiki, Kanako</creator><creator>Kumagai, Shinya</creator><creator>Miyake, Hideto</creator><creator>Iwaya, Motoaki</creator><general>IOP Publishing</general><scope>AAYXX</scope><scope>CITATION</scope><orcidid>https://orcid.org/0000-0002-4889-706X</orcidid><orcidid>https://orcid.org/0000-0003-0781-7016</orcidid></search><sort><creationdate>20221101</creationdate><title>A method for exfoliating AlGaN films from sapphire substrates using heated and pressurized water</title><author>Matsubara, Eri ; Hasegawa, Ryota ; Nishibayashi, Toma ; Yabutani, Ayumu ; Yamada, Ryoya ; Imoto, Yoshinori ; Kondo, Ryosuke ; Iwayama, Sho ; Takeuchi, Tetsuya ; Kamiyama, Satoshi ; Shojiki, Kanako ; Kumagai, Shinya ; Miyake, Hideto ; Iwaya, Motoaki</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c383t-66d8df2d0a2aea15f90a1e11818bf0eca72b48ab162d306523430764da15bdcb3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2022</creationdate><topic>AlGaN</topic><topic>AlN nanopillars</topic><topic>heated and pressurized water</topic><topic>substrate exfoliation</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Matsubara, Eri</creatorcontrib><creatorcontrib>Hasegawa, Ryota</creatorcontrib><creatorcontrib>Nishibayashi, Toma</creatorcontrib><creatorcontrib>Yabutani, Ayumu</creatorcontrib><creatorcontrib>Yamada, Ryoya</creatorcontrib><creatorcontrib>Imoto, Yoshinori</creatorcontrib><creatorcontrib>Kondo, Ryosuke</creatorcontrib><creatorcontrib>Iwayama, Sho</creatorcontrib><creatorcontrib>Takeuchi, Tetsuya</creatorcontrib><creatorcontrib>Kamiyama, Satoshi</creatorcontrib><creatorcontrib>Shojiki, Kanako</creatorcontrib><creatorcontrib>Kumagai, Shinya</creatorcontrib><creatorcontrib>Miyake, Hideto</creatorcontrib><creatorcontrib>Iwaya, Motoaki</creatorcontrib><collection>CrossRef</collection><jtitle>Applied physics express</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Matsubara, Eri</au><au>Hasegawa, Ryota</au><au>Nishibayashi, Toma</au><au>Yabutani, Ayumu</au><au>Yamada, Ryoya</au><au>Imoto, Yoshinori</au><au>Kondo, Ryosuke</au><au>Iwayama, Sho</au><au>Takeuchi, Tetsuya</au><au>Kamiyama, Satoshi</au><au>Shojiki, Kanako</au><au>Kumagai, Shinya</au><au>Miyake, Hideto</au><au>Iwaya, Motoaki</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>A method for exfoliating AlGaN films from sapphire substrates using heated and pressurized water</atitle><jtitle>Applied physics express</jtitle><addtitle>Appl. Phys. Express</addtitle><date>2022-11-01</date><risdate>2022</risdate><volume>15</volume><issue>11</issue><spage>116502</spage><pages>116502-</pages><issn>1882-0778</issn><eissn>1882-0786</eissn><coden>APEPC4</coden><abstract>Thin films of AlN, AlGaN, and AlGaN-based device structures of approximately 1 cm
2
formed on a sapphire substrate were successfully exfoliated from the substrate by immersion in heated (115 °C) and pressurized (170 kPa) water. These thin films were crystalline, grown on periodically formed AlN nanopillars. The water was permeated through intentional voids formed in the AlGaN or AlN crystalline layers by using periodic AlN nanopillars. The exfoliated AlGaN exhibited clear X-ray diffraction peaks from its (0002) plane diffraction. Transmission electron microscopy (TEM) confirmed that exfoliation introduced few additional dislocations and that the device structure was maintained.</abstract><pub>IOP Publishing</pub><doi>10.35848/1882-0786/ac97dc</doi><tpages>6</tpages><orcidid>https://orcid.org/0000-0002-4889-706X</orcidid><orcidid>https://orcid.org/0000-0003-0781-7016</orcidid></addata></record> |
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source | IOPscience journals; Institute of Physics |
subjects | AlGaN AlN nanopillars heated and pressurized water substrate exfoliation |
title | A method for exfoliating AlGaN films from sapphire substrates using heated and pressurized water |
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