Loading…

A method for exfoliating AlGaN films from sapphire substrates using heated and pressurized water

Thin films of AlN, AlGaN, and AlGaN-based device structures of approximately 1 cm 2 formed on a sapphire substrate were successfully exfoliated from the substrate by immersion in heated (115 °C) and pressurized (170 kPa) water. These thin films were crystalline, grown on periodically formed AlN nano...

Full description

Saved in:
Bibliographic Details
Published in:Applied physics express 2022-11, Vol.15 (11), p.116502
Main Authors: Matsubara, Eri, Hasegawa, Ryota, Nishibayashi, Toma, Yabutani, Ayumu, Yamada, Ryoya, Imoto, Yoshinori, Kondo, Ryosuke, Iwayama, Sho, Takeuchi, Tetsuya, Kamiyama, Satoshi, Shojiki, Kanako, Kumagai, Shinya, Miyake, Hideto, Iwaya, Motoaki
Format: Article
Language:English
Subjects:
Citations: Items that this one cites
Items that cite this one
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
cited_by cdi_FETCH-LOGICAL-c383t-66d8df2d0a2aea15f90a1e11818bf0eca72b48ab162d306523430764da15bdcb3
cites cdi_FETCH-LOGICAL-c383t-66d8df2d0a2aea15f90a1e11818bf0eca72b48ab162d306523430764da15bdcb3
container_end_page
container_issue 11
container_start_page 116502
container_title Applied physics express
container_volume 15
creator Matsubara, Eri
Hasegawa, Ryota
Nishibayashi, Toma
Yabutani, Ayumu
Yamada, Ryoya
Imoto, Yoshinori
Kondo, Ryosuke
Iwayama, Sho
Takeuchi, Tetsuya
Kamiyama, Satoshi
Shojiki, Kanako
Kumagai, Shinya
Miyake, Hideto
Iwaya, Motoaki
description Thin films of AlN, AlGaN, and AlGaN-based device structures of approximately 1 cm 2 formed on a sapphire substrate were successfully exfoliated from the substrate by immersion in heated (115 °C) and pressurized (170 kPa) water. These thin films were crystalline, grown on periodically formed AlN nanopillars. The water was permeated through intentional voids formed in the AlGaN or AlN crystalline layers by using periodic AlN nanopillars. The exfoliated AlGaN exhibited clear X-ray diffraction peaks from its (0002) plane diffraction. Transmission electron microscopy (TEM) confirmed that exfoliation introduced few additional dislocations and that the device structure was maintained.
doi_str_mv 10.35848/1882-0786/ac97dc
format article
fullrecord <record><control><sourceid>iop_cross</sourceid><recordid>TN_cdi_iop_journals_10_35848_1882_0786_ac97dc</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>apexac97dc</sourcerecordid><originalsourceid>FETCH-LOGICAL-c383t-66d8df2d0a2aea15f90a1e11818bf0eca72b48ab162d306523430764da15bdcb3</originalsourceid><addsrcrecordid>eNp9kE9LAzEQxYMoWKsfwFuuHtbmz242PZaiVSh60XOc3SQ2ZbdZkl2sfnpTV3oSYWDmPd4Mww-ha0pueSFzOaNSsoyUUsygnpe6PkGTo3V6nEt5ji5i3BIick7FBL0tcGv6jdfY-oDN3vrGQe9273jRrOAJW9e0EdvgWxyh6zYuGByHKvYBehPxEA_RjUlCY9hp3AUT4xDcV9IfyQ2X6MxCE83Vb5-i1_u7l-VDtn5ePS4X66zmkveZEFpqyzQBBgZoYecEqKFUUllZYmooWZVLqKhgmhNRMJ5zUopcp2yl64pPER3v1sHHGIxVXXAthE9FifpBpA4M1IGHGhGlnWzccb5TWz-EXfrw3_zNH3nozF7RQlGaShSEqU5b_g0kOXhO</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype></control><display><type>article</type><title>A method for exfoliating AlGaN films from sapphire substrates using heated and pressurized water</title><source>IOPscience journals</source><source>Institute of Physics</source><creator>Matsubara, Eri ; Hasegawa, Ryota ; Nishibayashi, Toma ; Yabutani, Ayumu ; Yamada, Ryoya ; Imoto, Yoshinori ; Kondo, Ryosuke ; Iwayama, Sho ; Takeuchi, Tetsuya ; Kamiyama, Satoshi ; Shojiki, Kanako ; Kumagai, Shinya ; Miyake, Hideto ; Iwaya, Motoaki</creator><creatorcontrib>Matsubara, Eri ; Hasegawa, Ryota ; Nishibayashi, Toma ; Yabutani, Ayumu ; Yamada, Ryoya ; Imoto, Yoshinori ; Kondo, Ryosuke ; Iwayama, Sho ; Takeuchi, Tetsuya ; Kamiyama, Satoshi ; Shojiki, Kanako ; Kumagai, Shinya ; Miyake, Hideto ; Iwaya, Motoaki</creatorcontrib><description>Thin films of AlN, AlGaN, and AlGaN-based device structures of approximately 1 cm 2 formed on a sapphire substrate were successfully exfoliated from the substrate by immersion in heated (115 °C) and pressurized (170 kPa) water. These thin films were crystalline, grown on periodically formed AlN nanopillars. The water was permeated through intentional voids formed in the AlGaN or AlN crystalline layers by using periodic AlN nanopillars. The exfoliated AlGaN exhibited clear X-ray diffraction peaks from its (0002) plane diffraction. Transmission electron microscopy (TEM) confirmed that exfoliation introduced few additional dislocations and that the device structure was maintained.</description><identifier>ISSN: 1882-0778</identifier><identifier>EISSN: 1882-0786</identifier><identifier>DOI: 10.35848/1882-0786/ac97dc</identifier><identifier>CODEN: APEPC4</identifier><language>eng</language><publisher>IOP Publishing</publisher><subject>AlGaN ; AlN nanopillars ; heated and pressurized water ; substrate exfoliation</subject><ispartof>Applied physics express, 2022-11, Vol.15 (11), p.116502</ispartof><rights>2022 The Japan Society of Applied Physics</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c383t-66d8df2d0a2aea15f90a1e11818bf0eca72b48ab162d306523430764da15bdcb3</citedby><cites>FETCH-LOGICAL-c383t-66d8df2d0a2aea15f90a1e11818bf0eca72b48ab162d306523430764da15bdcb3</cites><orcidid>0000-0002-4889-706X ; 0000-0003-0781-7016</orcidid></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktopdf>$$Uhttps://iopscience.iop.org/article/10.35848/1882-0786/ac97dc/pdf$$EPDF$$P50$$Giop$$H</linktopdf><link.rule.ids>314,780,784,27922,27923,38866,53838</link.rule.ids></links><search><creatorcontrib>Matsubara, Eri</creatorcontrib><creatorcontrib>Hasegawa, Ryota</creatorcontrib><creatorcontrib>Nishibayashi, Toma</creatorcontrib><creatorcontrib>Yabutani, Ayumu</creatorcontrib><creatorcontrib>Yamada, Ryoya</creatorcontrib><creatorcontrib>Imoto, Yoshinori</creatorcontrib><creatorcontrib>Kondo, Ryosuke</creatorcontrib><creatorcontrib>Iwayama, Sho</creatorcontrib><creatorcontrib>Takeuchi, Tetsuya</creatorcontrib><creatorcontrib>Kamiyama, Satoshi</creatorcontrib><creatorcontrib>Shojiki, Kanako</creatorcontrib><creatorcontrib>Kumagai, Shinya</creatorcontrib><creatorcontrib>Miyake, Hideto</creatorcontrib><creatorcontrib>Iwaya, Motoaki</creatorcontrib><title>A method for exfoliating AlGaN films from sapphire substrates using heated and pressurized water</title><title>Applied physics express</title><addtitle>Appl. Phys. Express</addtitle><description>Thin films of AlN, AlGaN, and AlGaN-based device structures of approximately 1 cm 2 formed on a sapphire substrate were successfully exfoliated from the substrate by immersion in heated (115 °C) and pressurized (170 kPa) water. These thin films were crystalline, grown on periodically formed AlN nanopillars. The water was permeated through intentional voids formed in the AlGaN or AlN crystalline layers by using periodic AlN nanopillars. The exfoliated AlGaN exhibited clear X-ray diffraction peaks from its (0002) plane diffraction. Transmission electron microscopy (TEM) confirmed that exfoliation introduced few additional dislocations and that the device structure was maintained.</description><subject>AlGaN</subject><subject>AlN nanopillars</subject><subject>heated and pressurized water</subject><subject>substrate exfoliation</subject><issn>1882-0778</issn><issn>1882-0786</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2022</creationdate><recordtype>article</recordtype><recordid>eNp9kE9LAzEQxYMoWKsfwFuuHtbmz242PZaiVSh60XOc3SQ2ZbdZkl2sfnpTV3oSYWDmPd4Mww-ha0pueSFzOaNSsoyUUsygnpe6PkGTo3V6nEt5ji5i3BIick7FBL0tcGv6jdfY-oDN3vrGQe9273jRrOAJW9e0EdvgWxyh6zYuGByHKvYBehPxEA_RjUlCY9hp3AUT4xDcV9IfyQ2X6MxCE83Vb5-i1_u7l-VDtn5ePS4X66zmkveZEFpqyzQBBgZoYecEqKFUUllZYmooWZVLqKhgmhNRMJ5zUopcp2yl64pPER3v1sHHGIxVXXAthE9FifpBpA4M1IGHGhGlnWzccb5TWz-EXfrw3_zNH3nozF7RQlGaShSEqU5b_g0kOXhO</recordid><startdate>20221101</startdate><enddate>20221101</enddate><creator>Matsubara, Eri</creator><creator>Hasegawa, Ryota</creator><creator>Nishibayashi, Toma</creator><creator>Yabutani, Ayumu</creator><creator>Yamada, Ryoya</creator><creator>Imoto, Yoshinori</creator><creator>Kondo, Ryosuke</creator><creator>Iwayama, Sho</creator><creator>Takeuchi, Tetsuya</creator><creator>Kamiyama, Satoshi</creator><creator>Shojiki, Kanako</creator><creator>Kumagai, Shinya</creator><creator>Miyake, Hideto</creator><creator>Iwaya, Motoaki</creator><general>IOP Publishing</general><scope>AAYXX</scope><scope>CITATION</scope><orcidid>https://orcid.org/0000-0002-4889-706X</orcidid><orcidid>https://orcid.org/0000-0003-0781-7016</orcidid></search><sort><creationdate>20221101</creationdate><title>A method for exfoliating AlGaN films from sapphire substrates using heated and pressurized water</title><author>Matsubara, Eri ; Hasegawa, Ryota ; Nishibayashi, Toma ; Yabutani, Ayumu ; Yamada, Ryoya ; Imoto, Yoshinori ; Kondo, Ryosuke ; Iwayama, Sho ; Takeuchi, Tetsuya ; Kamiyama, Satoshi ; Shojiki, Kanako ; Kumagai, Shinya ; Miyake, Hideto ; Iwaya, Motoaki</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c383t-66d8df2d0a2aea15f90a1e11818bf0eca72b48ab162d306523430764da15bdcb3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2022</creationdate><topic>AlGaN</topic><topic>AlN nanopillars</topic><topic>heated and pressurized water</topic><topic>substrate exfoliation</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Matsubara, Eri</creatorcontrib><creatorcontrib>Hasegawa, Ryota</creatorcontrib><creatorcontrib>Nishibayashi, Toma</creatorcontrib><creatorcontrib>Yabutani, Ayumu</creatorcontrib><creatorcontrib>Yamada, Ryoya</creatorcontrib><creatorcontrib>Imoto, Yoshinori</creatorcontrib><creatorcontrib>Kondo, Ryosuke</creatorcontrib><creatorcontrib>Iwayama, Sho</creatorcontrib><creatorcontrib>Takeuchi, Tetsuya</creatorcontrib><creatorcontrib>Kamiyama, Satoshi</creatorcontrib><creatorcontrib>Shojiki, Kanako</creatorcontrib><creatorcontrib>Kumagai, Shinya</creatorcontrib><creatorcontrib>Miyake, Hideto</creatorcontrib><creatorcontrib>Iwaya, Motoaki</creatorcontrib><collection>CrossRef</collection><jtitle>Applied physics express</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Matsubara, Eri</au><au>Hasegawa, Ryota</au><au>Nishibayashi, Toma</au><au>Yabutani, Ayumu</au><au>Yamada, Ryoya</au><au>Imoto, Yoshinori</au><au>Kondo, Ryosuke</au><au>Iwayama, Sho</au><au>Takeuchi, Tetsuya</au><au>Kamiyama, Satoshi</au><au>Shojiki, Kanako</au><au>Kumagai, Shinya</au><au>Miyake, Hideto</au><au>Iwaya, Motoaki</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>A method for exfoliating AlGaN films from sapphire substrates using heated and pressurized water</atitle><jtitle>Applied physics express</jtitle><addtitle>Appl. Phys. Express</addtitle><date>2022-11-01</date><risdate>2022</risdate><volume>15</volume><issue>11</issue><spage>116502</spage><pages>116502-</pages><issn>1882-0778</issn><eissn>1882-0786</eissn><coden>APEPC4</coden><abstract>Thin films of AlN, AlGaN, and AlGaN-based device structures of approximately 1 cm 2 formed on a sapphire substrate were successfully exfoliated from the substrate by immersion in heated (115 °C) and pressurized (170 kPa) water. These thin films were crystalline, grown on periodically formed AlN nanopillars. The water was permeated through intentional voids formed in the AlGaN or AlN crystalline layers by using periodic AlN nanopillars. The exfoliated AlGaN exhibited clear X-ray diffraction peaks from its (0002) plane diffraction. Transmission electron microscopy (TEM) confirmed that exfoliation introduced few additional dislocations and that the device structure was maintained.</abstract><pub>IOP Publishing</pub><doi>10.35848/1882-0786/ac97dc</doi><tpages>6</tpages><orcidid>https://orcid.org/0000-0002-4889-706X</orcidid><orcidid>https://orcid.org/0000-0003-0781-7016</orcidid></addata></record>
fulltext fulltext
identifier ISSN: 1882-0778
ispartof Applied physics express, 2022-11, Vol.15 (11), p.116502
issn 1882-0778
1882-0786
language eng
recordid cdi_iop_journals_10_35848_1882_0786_ac97dc
source IOPscience journals; Institute of Physics
subjects AlGaN
AlN nanopillars
heated and pressurized water
substrate exfoliation
title A method for exfoliating AlGaN films from sapphire substrates using heated and pressurized water
url http://sfxeu10.hosted.exlibrisgroup.com/loughborough?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-09T14%3A52%3A05IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-iop_cross&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=A%20method%20for%20exfoliating%20AlGaN%20films%20from%20sapphire%20substrates%20using%20heated%20and%20pressurized%20water&rft.jtitle=Applied%20physics%20express&rft.au=Matsubara,%20Eri&rft.date=2022-11-01&rft.volume=15&rft.issue=11&rft.spage=116502&rft.pages=116502-&rft.issn=1882-0778&rft.eissn=1882-0786&rft.coden=APEPC4&rft_id=info:doi/10.35848/1882-0786/ac97dc&rft_dat=%3Ciop_cross%3Eapexac97dc%3C/iop_cross%3E%3Cgrp_id%3Ecdi_FETCH-LOGICAL-c383t-66d8df2d0a2aea15f90a1e11818bf0eca72b48ab162d306523430764da15bdcb3%3C/grp_id%3E%3Coa%3E%3C/oa%3E%3Curl%3E%3C/url%3E&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true