Tri-halide vapor-phase epitaxy of GaN using GaCl3 on polar, semipolar, and nonpolar substrates

Homoepitaxial tri-halide vapor-phase epitaxy (THVPE) growth on polar, semipolar, and nonpolar bulk GaN substrates was demonstrated using GaCl3 as the precursor. The influence of the surface orientation of the substrate on GaN growth by THVPE was compared with that observed for GaN grown by hydride v...

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Published in:Applied physics express 2016-10, Vol.9 (10)
Main Authors: Iso, Kenji, Takekawa, Nao, Matsuda, Karen, Hikida, Kazuhiro, Hayashida, Naoto, Murakami, Hisashi, Koukitu, Akinori
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container_title Applied physics express
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Takekawa, Nao
Matsuda, Karen
Hikida, Kazuhiro
Hayashida, Naoto
Murakami, Hisashi
Koukitu, Akinori
description Homoepitaxial tri-halide vapor-phase epitaxy (THVPE) growth on polar, semipolar, and nonpolar bulk GaN substrates was demonstrated using GaCl3 as the precursor. The influence of the surface orientation of the substrate on GaN growth by THVPE was compared with that observed for GaN grown by hydride vapor-phase epitaxy. The dependence of the GaN growth on the surface orientation of the substrate was confirmed; GaN could be grown on , , , , and but not on , , , or . This behavior was explained to be due to the changes in adsorption energy, the magnitudes of which were estimated by theoretical calculations.
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title Tri-halide vapor-phase epitaxy of GaN using GaCl3 on polar, semipolar, and nonpolar substrates
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