Microwave discharge plasma production with resonant cavity for EUV mask inspection tool

A microwave-discharge-produced plasma source was developed to generate 13.5 nm extreme ultraviolet (EUV) radiation for application as a mask inspection tool. The EUV radiation of a system with a high Q-factor (>3900) resonant cavity and a solid-state oscillator was studied. The gas pressure and m...

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Bibliographic Details
Published in:Japanese Journal of Applied Physics 2015-12, Vol.54 (12), p.126701
Main Authors: Tashima, Saya, Ohnishi, Masami, Hugrass, Waheed, Sugimoto, Keita, Sakaguchi, Masatugu, Osawa, Hodaka, Nishimura, Hiroaki, Matsukuma, Hiraku
Format: Article
Language:English
Subjects:
Gas pressure
Holes
Inspection
Magnetic fields
Masks
Microwaves
Oscillators
Plasma (physics)
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Summary:A microwave-discharge-produced plasma source was developed to generate 13.5 nm extreme ultraviolet (EUV) radiation for application as a mask inspection tool. The EUV radiation of a system with a high Q-factor (>3900) resonant cavity and a solid-state oscillator was studied. The gas pressure and microwave power dependences on the EUV radiation for transverse-magnetic mode TM010 and transverse-electric mode TE111 were determined. For the solid-state oscillator, the efficiency of the EUV radiation over the input power was 5.8 times higher than that for a magnetron. EUV radiation of 10 mW/(2πsr) was observed under a gas pressure of 5 Pa and microwave power of 400 W. We expect that more EUV power and a smaller plasma is generated when a magnetic field is applied to confirm the plasma and a facility is operated with an improved system to cool an entire cavity.
ISSN:0021-4922
1347-4065
DOI:10.7567/JJAP.54.126701