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Growth evolution of γ′-Fe4N films on GaN(0001) and their interfacial structure
We report the growth parameter dependence of structural and magnetic properties of γ′-Fe4N thin films on GaN(0001) grown by plasma-assisted molecular beam epitaxy, particularly focusing on their interfacial structure. Reflection high-energy electron diffraction (RHEED) and X-ray diffraction reveal t...
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Published in: | Japanese Journal of Applied Physics 2016-05, Vol.55 (5S) |
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container_issue | 5S |
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container_title | Japanese Journal of Applied Physics |
container_volume | 55 |
creator | Kimura, Masamitsu Hasegawa, Shigehiko |
description | We report the growth parameter dependence of structural and magnetic properties of γ′-Fe4N thin films on GaN(0001) grown by plasma-assisted molecular beam epitaxy, particularly focusing on their interfacial structure. Reflection high-energy electron diffraction (RHEED) and X-ray diffraction reveal that γ′-Fe4N(111) layers are grown at the interface, while the succeeding layers are preferentially oriented to (111) or (100) depending on the growth conditions. The RHEED observation during the interface formation and the cross-sectional transmission electron microscopy observation indicate that the γ′-Fe4N(111)/GaN interface is abrupt. On the basis of the present findings, we propose the structural model for the interface. |
doi_str_mv | 10.7567/JJAP.55.05FD02 |
format | article |
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Reflection high-energy electron diffraction (RHEED) and X-ray diffraction reveal that γ′-Fe4N(111) layers are grown at the interface, while the succeeding layers are preferentially oriented to (111) or (100) depending on the growth conditions. The RHEED observation during the interface formation and the cross-sectional transmission electron microscopy observation indicate that the γ′-Fe4N(111)/GaN interface is abrupt. On the basis of the present findings, we propose the structural model for the interface.</description><identifier>ISSN: 0021-4922</identifier><identifier>EISSN: 1347-4065</identifier><identifier>DOI: 10.7567/JJAP.55.05FD02</identifier><identifier>CODEN: JJAPB6</identifier><language>eng</language><publisher>The Japan Society of Applied Physics</publisher><ispartof>Japanese Journal of Applied Physics, 2016-05, Vol.55 (5S)</ispartof><rights>2016 The Japan Society of Applied Physics</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktopdf>$$Uhttps://iopscience.iop.org/article/10.7567/JJAP.55.05FD02/pdf$$EPDF$$P50$$Giop$$H</linktopdf><link.rule.ids>314,780,784,27924,27925,38868,53840</link.rule.ids></links><search><creatorcontrib>Kimura, Masamitsu</creatorcontrib><creatorcontrib>Hasegawa, Shigehiko</creatorcontrib><title>Growth evolution of γ′-Fe4N films on GaN(0001) and their interfacial structure</title><title>Japanese Journal of Applied Physics</title><addtitle>Jpn. J. Appl. Phys</addtitle><description>We report the growth parameter dependence of structural and magnetic properties of γ′-Fe4N thin films on GaN(0001) grown by plasma-assisted molecular beam epitaxy, particularly focusing on their interfacial structure. Reflection high-energy electron diffraction (RHEED) and X-ray diffraction reveal that γ′-Fe4N(111) layers are grown at the interface, while the succeeding layers are preferentially oriented to (111) or (100) depending on the growth conditions. The RHEED observation during the interface formation and the cross-sectional transmission electron microscopy observation indicate that the γ′-Fe4N(111)/GaN interface is abrupt. 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J. Appl. Phys</addtitle><date>2016-05-01</date><risdate>2016</risdate><volume>55</volume><issue>5S</issue><issn>0021-4922</issn><eissn>1347-4065</eissn><coden>JJAPB6</coden><abstract>We report the growth parameter dependence of structural and magnetic properties of γ′-Fe4N thin films on GaN(0001) grown by plasma-assisted molecular beam epitaxy, particularly focusing on their interfacial structure. Reflection high-energy electron diffraction (RHEED) and X-ray diffraction reveal that γ′-Fe4N(111) layers are grown at the interface, while the succeeding layers are preferentially oriented to (111) or (100) depending on the growth conditions. The RHEED observation during the interface formation and the cross-sectional transmission electron microscopy observation indicate that the γ′-Fe4N(111)/GaN interface is abrupt. On the basis of the present findings, we propose the structural model for the interface.</abstract><pub>The Japan Society of Applied Physics</pub><doi>10.7567/JJAP.55.05FD02</doi><tpages>4</tpages></addata></record> |
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title | Growth evolution of γ′-Fe4N films on GaN(0001) and their interfacial structure |
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