Surface smoothing of indium tin oxide film by laser-induced photochemical etching

Surface smoothing of indium tin oxide (ITO) film by laser irradiation was demonstrated. The ITO surface was etched by choline radicals, which were activated by laser irradiation at a wavelength of 532 nm. The RMS surface roughness was improved from 5.6 to 4.6 nm after 10 min of laser irradiation. We...

Full description

Saved in:
Bibliographic Details
Published in:Japanese Journal of Applied Physics 2017-12, Vol.56 (12), p.128003
Main Authors: Kang, JoonHyun, Kim, Young-Hwan, Kwon, Seok Joon, Park, Joon-Suh, Park, Kyoung Wan, Park, Jae-Gwan, Han, Il Ki
Format: Article
Language:English
Subjects:
Choline
Desorption
Indium tin oxides
Irradiation
Lasers
Oxide coatings
Smoothing
Surface roughness
Tin oxides
Citations: Items that this one cites
Items that cite this one
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
Description
Summary:Surface smoothing of indium tin oxide (ITO) film by laser irradiation was demonstrated. The ITO surface was etched by choline radicals, which were activated by laser irradiation at a wavelength of 532 nm. The RMS surface roughness was improved from 5.6 to 4.6 nm after 10 min of laser irradiation. We also showed the changes in the surface morphology of the ITO film with various irradiation powers and times.
ISSN:0021-4922
1347-4065
DOI:10.7567/JJAP.56.128003