An investigation of the film growth of Y-Ba-Cu-O by DC magnetron sputtering

The film growth of YBaCuO by DC mangetron sputtering has been investigated in situ by Auger spectroscopy. The results show that there is a large composition difference between the target and the film. Cu is the first element appearing in the film at the initial stage of film growth. The final compos...

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Bibliographic Details
Published in:Journal of physics. D, Applied physics Applied physics, 1988-06, Vol.21 (6), p.1040-1042
Main Authors: Qi, Zh, Shi, W, Sun, J, Ke, H, Liu, L
Format: Article
Language:English
Subjects:
Cross-disciplinary physics: materials science
rheology
Exact sciences and technology
Growth from vapor
Materials science
Methods of crystal growth
physics of crystal growth
Physics
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Summary:The film growth of YBaCuO by DC mangetron sputtering has been investigated in situ by Auger spectroscopy. The results show that there is a large composition difference between the target and the film. Cu is the first element appearing in the film at the initial stage of film growth. The final composition of the film is dependent on the sputtering yield and the sticking coefficient for a multicomponent target during the DC sputtering process. 8 ref.--AA
ISSN:0022-3727
1361-6463
DOI:10.1088/0022-3727/21/6/033