Characterization of an ultra-low k SiO2 thin film prepared by molecular template

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Bibliographic Details
Published in:Physica scripta 2006-04, Vol.73, p.384
Main Authors: He, Zhi-Wei, Liu, Xue-Qin, Xu, Da-Yin, Wang, Yin-Yue
Format: Article
Language:English
Online Access:Get full text
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ISSN:1402-4896
1402-4896
DOI:10.1088/0031-8949/73/4/012