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Kinetics of wet oxidation at 1000 °C of Si0.5Ge0.5 relaxed alloy

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Bibliographic Details
Published in:	Semiconductor science and technology 1999-05, Vol.14 (5), p.484-487
Main Authors:	Zhang, J P, Hemment, P L F, Parker, E H C
Format:	Article
Language:	English
Subjects:	Cross-disciplinary physics: materials science rheology Exact sciences and technology Materials science Oxidation Physics Surface treatments
Online Access:	Get full text
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