Ultra-thin oxide reliability for ULSI applications

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Bibliographic Details
Published in:Semiconductor science and technology 2000-05, Vol.15 (5), p.425-435
Main Authors: Wu, Ernest Y, Stathis, James H, Han, Liang-Kai
Format: Article
Language:English
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ISSN:0268-1242
1361-6641
DOI:10.1088/0268-1242/15/5/301