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Stability of crystalline Gd2O3 thin films on silicon during rapid thermal annealing

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Bibliographic Details
Published in:Semiconductor science and technology 2008-03, Vol.23 (3), p.035010
Main Authors: Czernohorsky, M, Tetzlaff, D, Bugiel, E, Dargis, R, Osten, H J, Gottlob, H D B, Schmidt, M, Lemme, M C, Kurz, H
Format: Article
Language:English
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ISSN:0268-1242
1361-6641
DOI:10.1088/0268-1242/23/3/035010