Loading…

Epilayer and interface defects associated with relaxation of SiGe on Si studied by slow positron implantation

Saved in:
Bibliographic Details
Published in:Semiconductor science and technology 1989-09, Vol.4 (9), p.815-818
Main Authors: Baker, J A, Coleman, P G, Wakefield, B, Gibbings, C J, Tuppen, C G
Format: Article
Language:English
Subjects:
Citations: Items that this one cites
Items that cite this one
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
Description
Summary:
ISSN:0268-1242
1361-6641
DOI:10.1088/0268-1242/4/9/017