Loading…
Epilayer and interface defects associated with relaxation of SiGe on Si studied by slow positron implantation
Saved in:
Published in: | Semiconductor science and technology 1989-09, Vol.4 (9), p.815-818 |
---|---|
Main Authors: | , , , , |
Format: | Article |
Language: | English |
Subjects: | |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
Summary: | |
---|---|
ISSN: | 0268-1242 1361-6641 |
DOI: | 10.1088/0268-1242/4/9/017 |