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Low- or high-angle Ar ion-beam etching to create ramp-type Josephson junctions

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Bibliographic Details
Published in:Superconductor science & technology 1996-11, Vol.9 (11), p.978-984
Main Authors: Verbist, K, Lebedev, O I, Tendeloo, G Van, Verhoeven, M A J, Rijnders, A J H M, Blank, D H A
Format: Article
Language:English
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ISSN:0953-2048
1361-6668
DOI:10.1088/0953-2048/9/11/009