Nanopore formation by low-energy focused electron beam machining

The fabrication of nanopores in thin silicon nitride and aluminum oxide membranes by water vapor assisted, low-energy (0.2-20 kV) electron beam machining using a scanning electron microscope (SEM) is described. Using this technique, pores with diameters ranging in size from < 5 to 20 nm are easil...

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Bibliographic Details
Published in:Nanotechnology 2010-09, Vol.21 (37), p.375301-375301
Main Authors: Spinney, P S, Howitt, D G, Smith, R L, Collins, S D
Format: Article
Language:English
Subjects:
Aluminum oxide
Atomic force microscopy
Electron beam machining
Nanocomposites
Nanomaterials
Nanostructure
Scanning electron microscopy
Silicon nitride
Transmission electron microscopy
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Description
Summary:The fabrication of nanopores in thin silicon nitride and aluminum oxide membranes by water vapor assisted, low-energy (0.2-20 kV) electron beam machining using a scanning electron microscope (SEM) is described. Using this technique, pores with diameters ranging in size from < 5 to 20 nm are easily formed. The nanopores are characterized by SEM, transmission electron microscopy (TEM) and atomic force microscopy (AFM). The mechanism of etching is briefly discussed.
ISSN:0957-4484
1361-6528
DOI:10.1088/0957-4484/21/37/375301