Selectively released microstructures electroplated into thick positive photoresist

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Bibliographic Details
Published in:Journal of micromechanics and microengineering 1993-09, Vol.3 (3), p.152-154
Main Authors: Engelmann, G, Ehrmann, O, Leutenbauer, R, Schmitz, H, Reichl, H
Format: Article
Language:English
Subjects:
Applied sciences
Exact sciences and technology
Mechanical engineering. Machine design
Precision engineering, watch making
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ISSN:0960-1317
1361-6439
DOI:10.1088/0960-1317/3/3/015