Actinometric study on SiO2 etching by a dual-frequency magnetic triode reactor

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Bibliographic Details
Published in:Plasma sources science & technology 1992-08, Vol.1, p.151
Main Authors: Pische, V, Peccoud, L, Lassagne, P
Format: Article
Language:English
Online Access:Get full text
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ISSN:0963-0252
1361-6595
DOI:10.1088/0963-0252/1/3/002