Acetylene–argon plasmas measured at an rf-biased substrate electrode for diamond-like carbon deposition: II. Ion energy distributions

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Bibliographic Details
Published in:Plasma sources science & technology 2011-02, Vol.20 (1), p.015004
Main Authors: Baby, A, Mahony, C M O, Lemoine, P, Maguire, P D
Format: Article
Language:English
Subjects:
Etching and cleaning
Exact sciences and technology
Physics
Physics of gases, plasmas and electric discharges
Physics of plasmas and electric discharges
Plasma applications
Plasma diagnostic techniques and instrumentation
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ISSN:0963-0252
1361-6595
DOI:10.1088/0963-0252/20/1/015004