Microstructure of SiOx:H Films prepared by plasma enhanced chemical vapor deposition

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Bibliographic Details
Published in:Chinese physics (Beijing, China) China), 2000-04, Vol.9, p.309
Main Authors: Zhi-xun, Ma, Xian-bo, Liao, Guang-lin, Kong, Jun-hao, Chu
Format: Article
Language:English
Online Access:Get full text
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ISSN:1009-1963
DOI:10.1088/1009-1963/9/4/011