Effect of Photopolymerization on the Rate of Photocrosslink in Chalcone-based Oligomeric Compounds

A new photochemically bifunctional epoxy and dimethacrylate compounds were synthesized for investigating the photosensitivity under UV irradiation. Photosensitivity of the synthesized chalcone-based compounds was investigated by using UV-visible absorption and Fourier transformed infrared (FT-IR) sp...

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Bibliographic Details
Published in:Bulletin of the Korean Chemical Society 2001, Vol.22 (11), p.1207-1212
Main Authors: 최동훈, 오상준, 반시영, 오광용, Choe, Dong Hun, O, Sang Jun, Ban, Si Yeong, O, Gwang Yong
Format: Article
Language:Korean
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Summary:A new photochemically bifunctional epoxy and dimethacrylate compounds were synthesized for investigating the photosensitivity under UV irradiation. Photosensitivity of the synthesized chalcone-based compounds was investigated by using UV-visible absorption and Fourier transformed infrared (FT-IR) spectroscopies. The result of spectroscopic analysis substantiated that the two chalcone-based compounds have functions of both photocrosslinking and photopolymerization by UV exposure in the presence of photoinitiator. Two kinds of photochemical reactions proceeded competitively during UV exposure. Particularly, we studied the effect of photopolymerization on the rate of photocrosslink due to cycloaddition in the two oligomeric compounds.
ISSN:0253-2964
1229-5949