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Effect of Photopolymerization on the Rate of Photocrosslink in Chalcone-based Oligomeric Compounds
A new photochemically bifunctional epoxy and dimethacrylate compounds were synthesized for investigating the photosensitivity under UV irradiation. Photosensitivity of the synthesized chalcone-based compounds was investigated by using UV-visible absorption and Fourier transformed infrared (FT-IR) sp...
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| Published in: | Bulletin of the Korean Chemical Society 2001, Vol.22 (11), p.1207-1212 |
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| Main Authors: | , , , , , , , |
| Format: | Article |
| Language: | Korean |
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| container_end_page | 1212 |
| container_issue | 11 |
| container_start_page | 1207 |
| container_title | Bulletin of the Korean Chemical Society |
| container_volume | 22 |
| creator | 최동훈 오상준 반시영 오광용 Choe, Dong Hun O, Sang Jun Ban, Si Yeong O, Gwang Yong |
| description | A new photochemically bifunctional epoxy and dimethacrylate compounds were synthesized for investigating the photosensitivity under UV irradiation. Photosensitivity of the synthesized chalcone-based compounds was investigated by using UV-visible absorption and Fourier transformed infrared (FT-IR) spectroscopies. The result of spectroscopic analysis substantiated that the two chalcone-based compounds have functions of both photocrosslinking and photopolymerization by UV exposure in the presence of photoinitiator. Two kinds of photochemical reactions proceeded competitively during UV exposure. Particularly, we studied the effect of photopolymerization on the rate of photocrosslink due to cycloaddition in the two oligomeric compounds. |
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Photosensitivity of the synthesized chalcone-based compounds was investigated by using UV-visible absorption and Fourier transformed infrared (FT-IR) spectroscopies. The result of spectroscopic analysis substantiated that the two chalcone-based compounds have functions of both photocrosslinking and photopolymerization by UV exposure in the presence of photoinitiator. Two kinds of photochemical reactions proceeded competitively during UV exposure. 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| identifier | ISSN: 0253-2964 |
| ispartof | Bulletin of the Korean Chemical Society, 2001, Vol.22 (11), p.1207-1212 |
| issn | 0253-2964 1229-5949 |
| language | kor |
| recordid | cdi_kisti_ndsl_JAKO200113464477767 |
| source | Free Full-Text Journals in Chemistry |
| title | Effect of Photopolymerization on the Rate of Photocrosslink in Chalcone-based Oligomeric Compounds |
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