Photopolymerization of Methyl Methacrylate with p-X-$C_{6}H_{4}SiH_{3}$ (X = F, $CH_3$, $OCH_3$)

• Published in: Bulletin of the Korean Chemical Society 2001, Vol.22 (12), p.1337-1340
• Main Authors: 우희권, 김보혜, 조명식, 김대영, 최영섭, 곽영채, 함희석, 김동표, 황택성, U, Hui Gwon, Kim, Bo Hye, Jo, Myeong Sik, Kim, Dae Yeong, Choe, Yeong Seop, Gwak, Yeong Chae, Ham, Hui Seok, Kim, Dong Pyo, Hwang, Taek Seong
• Format: Article
• Language: Korean
• ISSN: 0253-2964; 1229-5949

The bulk photopolymerization of methyl methacrylate (MMA) with para-substituted phenylsilanes such as F-C6H4SiH3 (1), H3C-C6H4SiH3 (2), and H3CO-C6H4SiH3 (3) was performed to produce poly(MMA)s containing the respective silyl moiety as an end group. For all the hydrosilanes, the polymerization yields and the polymer molecular weights decreased, whereas the TGA residue yields and the relative intensities of Si-H IR stretching bands increased as the relative silane concentration over MMA increased. The polymerization yields and polymer molecular weights of MMA with 1-3 increased in the order of 3 < 1 < 2. These hydrosilanes influence significantly upon the photopolymerization of MMA as both chain-initiation and chain-transfer agents.