The development of surface morphology during ion etching

This thesis investigates the changes in surface shape which Occur when solid surfaces are subjected to bombardment and erosion by Energetic ion beams. The aspects which are studied lay particular emphasis on the type of problems encountered in the electronics industry where ion etching is used for t...

Full description

Saved in:
Bibliographic Details
Main Author: Surinder S. Makh
Format: Dissertation
Language:English
Subjects:
Other physical sciences not elsewhere classified
Physical Sciences not elsewhere classified
Online Access:Request full text
Tags: Add Tag
No Tags, Be the first to tag this record!
Description
Summary:This thesis investigates the changes in surface shape which Occur when solid surfaces are subjected to bombardment and erosion by Energetic ion beams. The aspects which are studied lay particular emphasis on the type of problems encountered in the electronics industry where ion etching is used for the production of micro-relief on many commercial devices. Ion etching is also used extensively in surface analysis using techniques such as Auger Electron Spectroscopy, X-ray Photoelectron Spectroscopy and Secondary Ion Mass Spectroscopy both for surface cleaning and composition-depth profiling. [Continues.]