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The Photolysis of 3,3,3-Trifluoropropyne
The photolysis of 3,3,3-trifluoropropyne has been studied in the 190 nm wavelength region. The primary process is the dissociation of the compound to give ethynyl and trifluoromethyl radicals. In the presence of propane, these radicals undergo abstraction reactions to give fluoroform and acetylene....
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Published in: | Canadian journal of chemistry 1973-05, Vol.51 (10), p.1655-1658 |
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Format: | Article |
Language: | English |
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container_end_page | 1658 |
container_issue | 10 |
container_start_page | 1655 |
container_title | Canadian journal of chemistry |
container_volume | 51 |
creator | Howarth, D. F Sherwood, A. G |
description | The photolysis of 3,3,3-trifluoropropyne has been studied in the 190 nm wavelength region. The primary process is the dissociation of the compound to give ethynyl and trifluoromethyl radicals. In the presence of propane, these radicals undergo abstraction reactions to give fluoroform and acetylene. The presence of nitric oxide also results in the trapping of the CF
3
radical as CF
3
NO. Ethynyl radicals are not trapped by NO. |
doi_str_mv | 10.1139/v73-247 |
format | article |
fullrecord | <record><control><sourceid>crossref_nrcre</sourceid><recordid>TN_cdi_nrcresearch_primary_10_1139_v73_247</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>10_1139_v73_247</sourcerecordid><originalsourceid>FETCH-LOGICAL-c221t-9c3bf703d797b6c6d70c734141ac22c889b6f1eadbca91f692e6b575900061633</originalsourceid><addsrcrecordid>eNp1z01LxDAQBuAgCtZV_As9qYjRTJImzVEWv2BBD_Uc0jShlbopySr0329kFw-CzMAw8DDMi9A5kFsApu6-JcOUywNUAK8JZlTBISoIITXmhNNjdJLSR14loVWBrprelW992IRxTkMqgy_ZTS7cxMGPXyGGKfe8dqfoyJsxubP9XKD3x4dm-YxXr08vy_sVtpTCBivLWi8J66SSrbCik8RKxoGDycDWtWqFB2e61hoFXijqRFvJSuWPBAjGFuhyd9fGkFJ0Xk9x-DRx1kD0T0CdA-ocMMuLnVxHG11yJtr-F--Rnjqf4fX_8O_VLUfkXHQ</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype></control><display><type>article</type><title>The Photolysis of 3,3,3-Trifluoropropyne</title><source>EZB Electronic Journals Library</source><creator>Howarth, D. F ; Sherwood, A. G</creator><creatorcontrib>Howarth, D. F ; Sherwood, A. G</creatorcontrib><description>The photolysis of 3,3,3-trifluoropropyne has been studied in the 190 nm wavelength region. The primary process is the dissociation of the compound to give ethynyl and trifluoromethyl radicals. In the presence of propane, these radicals undergo abstraction reactions to give fluoroform and acetylene. The presence of nitric oxide also results in the trapping of the CF
3
radical as CF
3
NO. Ethynyl radicals are not trapped by NO.</description><identifier>ISSN: 0008-4042</identifier><identifier>EISSN: 1480-3291</identifier><identifier>DOI: 10.1139/v73-247</identifier><language>eng</language><publisher>Ottawa, Canada: NRC Research Press</publisher><ispartof>Canadian journal of chemistry, 1973-05, Vol.51 (10), p.1655-1658</ispartof><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c221t-9c3bf703d797b6c6d70c734141ac22c889b6f1eadbca91f692e6b575900061633</citedby></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,780,784,27923,27924</link.rule.ids></links><search><creatorcontrib>Howarth, D. F</creatorcontrib><creatorcontrib>Sherwood, A. G</creatorcontrib><title>The Photolysis of 3,3,3-Trifluoropropyne</title><title>Canadian journal of chemistry</title><addtitle>Revue canadienne de chimie</addtitle><description>The photolysis of 3,3,3-trifluoropropyne has been studied in the 190 nm wavelength region. The primary process is the dissociation of the compound to give ethynyl and trifluoromethyl radicals. In the presence of propane, these radicals undergo abstraction reactions to give fluoroform and acetylene. The presence of nitric oxide also results in the trapping of the CF
3
radical as CF
3
NO. Ethynyl radicals are not trapped by NO.</description><issn>0008-4042</issn><issn>1480-3291</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>1973</creationdate><recordtype>article</recordtype><recordid>eNp1z01LxDAQBuAgCtZV_As9qYjRTJImzVEWv2BBD_Uc0jShlbopySr0329kFw-CzMAw8DDMi9A5kFsApu6-JcOUywNUAK8JZlTBISoIITXmhNNjdJLSR14loVWBrprelW992IRxTkMqgy_ZTS7cxMGPXyGGKfe8dqfoyJsxubP9XKD3x4dm-YxXr08vy_sVtpTCBivLWi8J66SSrbCik8RKxoGDycDWtWqFB2e61hoFXijqRFvJSuWPBAjGFuhyd9fGkFJ0Xk9x-DRx1kD0T0CdA-ocMMuLnVxHG11yJtr-F--Rnjqf4fX_8O_VLUfkXHQ</recordid><startdate>19730515</startdate><enddate>19730515</enddate><creator>Howarth, D. F</creator><creator>Sherwood, A. G</creator><general>NRC Research Press</general><scope>AAYXX</scope><scope>CITATION</scope></search><sort><creationdate>19730515</creationdate><title>The Photolysis of 3,3,3-Trifluoropropyne</title><author>Howarth, D. F ; Sherwood, A. G</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c221t-9c3bf703d797b6c6d70c734141ac22c889b6f1eadbca91f692e6b575900061633</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>1973</creationdate><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Howarth, D. F</creatorcontrib><creatorcontrib>Sherwood, A. G</creatorcontrib><collection>CrossRef</collection><jtitle>Canadian journal of chemistry</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Howarth, D. F</au><au>Sherwood, A. G</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>The Photolysis of 3,3,3-Trifluoropropyne</atitle><jtitle>Canadian journal of chemistry</jtitle><addtitle>Revue canadienne de chimie</addtitle><date>1973-05-15</date><risdate>1973</risdate><volume>51</volume><issue>10</issue><spage>1655</spage><epage>1658</epage><pages>1655-1658</pages><issn>0008-4042</issn><eissn>1480-3291</eissn><abstract>The photolysis of 3,3,3-trifluoropropyne has been studied in the 190 nm wavelength region. The primary process is the dissociation of the compound to give ethynyl and trifluoromethyl radicals. In the presence of propane, these radicals undergo abstraction reactions to give fluoroform and acetylene. The presence of nitric oxide also results in the trapping of the CF
3
radical as CF
3
NO. Ethynyl radicals are not trapped by NO.</abstract><cop>Ottawa, Canada</cop><pub>NRC Research Press</pub><doi>10.1139/v73-247</doi><tpages>4</tpages></addata></record> |
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ispartof | Canadian journal of chemistry, 1973-05, Vol.51 (10), p.1655-1658 |
issn | 0008-4042 1480-3291 |
language | eng |
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title | The Photolysis of 3,3,3-Trifluoropropyne |
url | http://sfxeu10.hosted.exlibrisgroup.com/loughborough?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-13T01%3A43%3A08IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-crossref_nrcre&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=The%20Photolysis%20of%203,3,3-Trifluoropropyne&rft.jtitle=Canadian%20journal%20of%20chemistry&rft.au=Howarth,%20D.%20F&rft.date=1973-05-15&rft.volume=51&rft.issue=10&rft.spage=1655&rft.epage=1658&rft.pages=1655-1658&rft.issn=0008-4042&rft.eissn=1480-3291&rft_id=info:doi/10.1139/v73-247&rft_dat=%3Ccrossref_nrcre%3E10_1139_v73_247%3C/crossref_nrcre%3E%3Cgrp_id%3Ecdi_FETCH-LOGICAL-c221t-9c3bf703d797b6c6d70c734141ac22c889b6f1eadbca91f692e6b575900061633%3C/grp_id%3E%3Coa%3E%3C/oa%3E%3Curl%3E%3C/url%3E&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |