Development and commissioning of the UNIST electron beam ion trap

An electron beam ion trap (EBIT) creates and confines highly charged ions (HCIs). To maximize the movement of the EBIT towards and away from the accelerator beamlines, we adopted permanent magnets, thereby reducing the size and maintenance costs associated with the EBIT. A magnetic field of 0 . 84 T...

Full description

Saved in:
Bibliographic Details
Published in:Journal of the Korean Physical Society 2024, 84(5), , pp.337-350
Main Authors: Park, SungNam, Shin, Bokkyun, Cosgun, Emre, Han, JeHwan, Chung, Moses
Format: Article
Language:English
Subjects:
Argon ions
Electron beams
Electrons
Free electron lasers
Ions
Maintenance costs
Mathematical and Computational Physics
Original Paper - Fluids
Particle and Nuclear Physics
Permanent magnets
Physics
Physics and Astronomy
Plasma and Phenomenology
Theoretical
X-ray fluorescence
물리학
Citations: Items that this one cites
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
Description
Summary:An electron beam ion trap (EBIT) creates and confines highly charged ions (HCIs). To maximize the movement of the EBIT towards and away from the accelerator beamlines, we adopted permanent magnets, thereby reducing the size and maintenance costs associated with the EBIT. A magnetic field of 0 . 84 T at the trap center provided a trap capacity of approximately 10 7 charges. By sweeping the electron beam energy from 2 . 4 keV to 3 . 3 keV at an electron beam current of 10 mA, the silicon drift detector successfully measured the KLL lines of the HCI states of argon and confirmed the presence of up to He-like argon ions. Before measuring the highly charged irons for astrophysics purposes, we conducted preliminary experiments to connect the EBIT with the Pohang Accelerator Laboratory X-ray Free Electron Laser (PAL-XFEL) hard X-ray beamline. In this study, we present the initial operation of the compact EBIT at an XFEL facility, demonstrating its X-ray fluorescence measurement capability.
ISSN:0374-4884
1976-8524
DOI:10.1007/s40042-023-01002-6