Plasmon Assisted Deep-ultraviolet Pulse Generation from Amorphous Silicon Dioxide in Nano-aperture

Ultrafast deep-ultraviolet (DUV) pulse generation from the subwavelength aperture of a plasmonic waveguide was investigated. The plasmonic nanofocusing of near-infrared (NIR) pulses was exploited to enhance DUV photoemission of surface third harmonic generation (STHG) at the amorphous SiO 2 dielectr...

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Bibliographic Details
Published in:Current optics and photonics 2018, 2(4), , pp.361-367
Main Authors: Hyunsu Lee, Heesang Ahn, Kyujung Kim, Seungchul Kim
Format: Article
Language:English
Subjects:
물리학
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Summary:Ultrafast deep-ultraviolet (DUV) pulse generation from the subwavelength aperture of a plasmonic waveguide was investigated. The plasmonic nanofocusing of near-infrared (NIR) pulses was exploited to enhance DUV photoemission of surface third harmonic generation (STHG) at the amorphous SiO 2 dielectric. The generated DUV pulses which are successfully made from a nano-aperture using 10 fs NIR pulses have a spectral bandwidth of 13 nm at a carrier wavelength of 266 nm. This method is applicable for tip-based ultrafast UV laser spectroscopy of nanostructures or biomolecules. KCI Citation Count: 0
ISSN:2508-7266
2508-7274
DOI:10.3807/COPP.2018.2.4.361